XUV metrology and XUV imaging using structured light beams
Advancing precise XUV characterization and imaging through tailored structured light sources.
Project Overview
QuantLight is advancing XUV metrology and imaging by harnessing structured light beams shaped through high-precision diffractive optics. This project focuses on generating tailored wavefronts in the extreme ultraviolet spectrum to enable nanoscale resolution and material-specific contrast.
The system integrates custom diffractive elements with high-power XUV sources, delivering stable, loss-minimized beam profiles for semiconductor inspection, ultrafast dynamics, and nanofabrication.
Challenges & Constraints
Operating in the XUV regime presents unique challenges: optical materials must withstand high photon energies, and beam shaping must maintain coherence at nanometric scales. Fabrication precision and thermal stability were critical constraints in achieving reliable performance.
Wavefront Control
Diffractive optics engineered to shape XUV beams with precise phase modulation for enhanced imaging fidelity.
Material Compatibility
Selection of XUV-tolerant substrates and coatings to ensure minimal absorption and high structural integrity.
Nanometric Precision
Fabrication techniques optimized for sub-wavelength accuracy to preserve beam coherence and spatial resolution.
Project Solution
QuantLight developed a scalable XUV beam shaping platform using simulation-driven DOE design and advanced nanofabrication. The solution enables structured illumination tailored for specific imaging and metrology tasks, with minimal energy loss and high repeatability.
Final Result
The final system delivers structured XUV beams with exceptional spatial control, enabling breakthroughs in nanoscale inspection and ultrafast imaging. QuantLight’s optics are now integrated into next-generation XUV instrumentation across research and industrial platforms.